Fabrication of the Crystalline ITO Pattern by Picosecond Laser with a Diffractive Optical Element
نویسندگان
چکیده
This study presents the fabrication of crystalline indium tin oxide (c-ITO) patterns on glass substrate using laser-induced crystallization followed by chemical etching. In the proposed approach, an amorphous ITO (a-ITO) thin film was transformed into a c-ITO structure over a predetermined area using infrared picosecond fiber laser irradiation with a 500 kHz repetition rate, under a single laser beam or multiple laser beams by diffractive optical elements (DOE). The residual a-ITO thin film was removed by an etchant solution, in order to form a uniform c-ITO pattern. The formation was due to the heat accumulation effect provided by the high-repetition rate of picosecond laser pulses.
منابع مشابه
Fabrication and Optical Characterization of Zinc Oxide Nanoparticles Prepared via a Simple Sol-gel Method
In this research zinc oxide (ZnO) nano-crystalline powders were prepared by sol-gel method using zinc acetate. The ZnO nanoparticles were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), ultraviolet-visible (UV-Vis), Fourier transform infra-red (FT-IR) and energy dispersive X-ray (EDX) spectroscopy. The structure of nanoparticles was studied using XRD pattern. The c...
متن کاملFive beam holographic lithography for simultaneous fabrication of three dimensional photonic crystal templates and line defects using phase tunable diffractive optical element.
This paper demonstrates an approach for laser holographic patterning of three-dimensional photonic lattice structures using a single diffractive optical element. The diffractive optical element is fabricated by recording gratings in a photosensitive polymer using a two-beam interference method and has four diffraction gratings oriented with four-fold symmetry around a central opening. Four firs...
متن کاملFabrication and Optical Characterization of Silicon Nanostructure Arrays by Laser Interference Lithography and Metal-Assisted Chemical Etching
In this paper metal-assisted chemical etching has been applied to pattern porous silicon regions and silicon nanohole arrays in submicron period simply by using positive photoresist as a mask layer. In order to define silicon nanostructures, Metal-assisted chemical etching (MaCE) was carried out with silver catalyst. Provided solution (or materiel) in combination with laser interference lithogr...
متن کاملA Study of ZnO Buffer Layer Effect on Physical Properties of ITO Thin Films Deposited on Different Substrates
The improvement of the physical properties of Indium Tin Oxide (ITO) layers is quite advantageous in photovoltaic applications. In this study the ITO film is deposited by RF sputtering onto p-type crystalline silicon (c-Si) with (100) orientation, multicrystalline silicon (mc-Si), and glass substrates coated with ZnO and annealed in vacuum furnace at 400°C. Electrical, optical, structural a...
متن کاملThe Effect of Tin Weight Fraction and Annealing Condition on Electrical and Optical Properties of ITO/TiO2 Nanostructured Film
High transparent conductive indium tin oxide/titanium dioxide (ITO/TiO2) nanostructured thin film is prepared by sol-gel dip-coating technique. This method yielded monodisperse ITO nanoparticles with mean diameter of 12 nm. The atomic composition of the Sn within the ITO structure changed from 0-20 wt.%. Through controlled annealing temperature at 550 oC, the result...
متن کامل